Figure 1 | Mechanism of the feature size modulation using IL-GPSE (IMAGE)

Light Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS

Figure 1 | Mechanism of the feature size modulation using IL-GPSE

Caption

Step 1, a two-beam IL is performed on the photoresist to form periodic latent exposed regions with a sinusoidal dose profile. Step 2, a secondary exposure follows the IL exposure and modulates the effective dose applied on the photoresist, which increases the portion of the photoresist that receives an above-threshold dose, and then reduces the linewidth of the photoresist after development.

Credit

by Zhuofei Gan, Hongtao Feng, Liyang Chen, Siyi Min, Chuwei Liang, Menghong Xu, Zijie Jiang, Zhao Sun, Chuying Sun, Dehu Cui, and Wen-Di Li.

Usage Restrictions

Credit must be given to the creator.

License

CC BY

Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.