Figure 3 | Wafer-scale nanodevices fabricated by IL-GPSE (IMAGE)

Light Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS

Figure 3 | Wafer-scale nanodevices fabricated by IL-GPSE

Caption

a-d, A comparison of nanogratings on 4-inch wafer fabricated by IL only and by IL-GPSE, indicating that IL-GPSE allows wafer-scale nanostructure patterning with improved uniformity by compensating the linewidth variation caused by the non-uniform IL exposure field. e-f, A demonstration of the 3-inch grayscale painting of Along the River During the Qingming Festival in the photoresist patterned by IL-GPSE.

Credit

by Zhuofei Gan, Hongtao Feng, Liyang Chen, Siyi Min, Chuwei Liang, Menghong Xu, Zijie Jiang, Zhao Sun, Chuying Sun, Dehu Cui, and Wen-Di Li.

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CC BY

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