Reduced Stress in Films Created with Synchronized Pulsed Substrate Bias (IMAGE)
Caption
Measurements of film stress and lattice properties for films created without a bias (floating), with a continuous bias of 50V, with synchronized pulsed substrate biases (50V, 100V, 200V) using argon as the sputtering gas, and with a synchronized pulsed substrate bias of 50V using krypton as the sputtering gas. FWHM (Full Width at Half Maximum) is a measure of how well ordered the atoms in the films are (the lower the FWHM, the more ordered it is); the lattice parameter is the size of the repeating cells of the crystalline film, with a limit given by the hypothetical "perfectly relaxed" or unstrained crystal.
Credit
Tokyo Metropolitan University
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