Selective Pulsed Bias on Tungsten Targets (IMAGE)

Tokyo Metropolitan University

Selective Pulsed Bias on Tungsten Targets

Caption

(top left) An illustration of the HiPIMS process (top right) The energy distribution of tungsten ions arriving at the substrate over time. At short times, there are a large proportion of ions with high energy. (bottom) Stress-free tungsten films created with the selective pulsed bias technique. (a) Plan view transmission electron microscopy (TEM) image of the film; (b) a higher resolution image; (c) reconstructions of the selected area in (b) based on inverse Fourier transforms, with two regions magnified.

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Tokyo Metropolitan University

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