Comparison of the fiber and thin film formed on SiO2/Si and Cu substrates using the same C12S3Br6 molecule source (IMAGE)

Science China Press

Comparison of the fiber and thin film formed on SiO2/Si and Cu substrates using the same C12S3Br6 molecule source

Caption

(a) Schematic of vapor deposition process with two heat zones. (b) SEM image of fibers formed on SiO2/Si substrate. (c) Comparison of XRD data for fibers and the source. (d) TEM image of a fiber. (e) Corresponding SAED pattern of the fiber in d. (f) Optical image of thin-film transferred onto SiO2/Si substrate. Inset: a 5 cm × 5 cm thin film on Si/SiO2 wafer. (g) Optical closed-up image of a thin film with an edge. Inset: the corresponding SEM image of the thin film sample. (h) AFM height image of the thin film with an edge on a SiO2/Si substrate, which shows that the thickness of the thin film is approximately 2.81 nm (Inset). (i) XPS spectra of a thin film on SiO2/Si (top red) and source (bottom blue), showing the absence of Br groups in the thin film.

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