Hybrid Resist Team (IMAGE)

DOE/Brookhaven National Laboratory

Hybrid Resist Team

Caption

(Left to right): Ashwanth Subramanian, Ming Lu, Kim Kisslinger, Chang-Yong Nam, and Nikhil Tiwale in the Electron Microscopy Facility at Brookhaven Lab's Center for Functional Nanomaterials. The scientists used scanning electron microscopes to image high-resolution, high-aspect-ratio silicon nanostructures they etched using a "hybrid" organic-inorganic resist.

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Brookhaven National Laboratory

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