Schematic of Hybrid Resist Process (IMAGE)

DOE/Brookhaven National Laboratory

Schematic of Hybrid Resist Process

Caption

A schematic showing the process of creating the hybrid organic-inorganic resist through infiltration synthesis, patterning the resist via electron-beam lithography, and etching the pattern into silicon by bombarding the silicon surface with ions of sulfur hexafluoride (SF6).

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Brookhaven National Laboratory

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