Exfoliation and growth of CMD-N-P2 ultrathin flakes. (IMAGE)

The Hong Kong Polytechnic University

Exfoliation and growth of CMD-N-P2 ultrathin flakes.

Caption

(A) AFM height image and line profile of 30 μm–sized CMD-N-P2 exfoliated by sonication in dichloromethane. Scale bar is 10 μm. (B) AFM height image and line profile of CMD-N-P2 grown on SiO2 substrate with 0.1 weight percent (wt%) solution. Scale bar is 6 μm. (C) AFM height image and line profile of CMD-N-P2 grown on SiO2 substrate with 1 wt% solution, showing 6 layers. Scale bar is 3 μm. (D) AFM height image and line profile of a screw dislocation in the clockwise direction. Scale bar is 3 μm.

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© 2024 Research and Innovation Office, The Hong Kong Polytechnic University. All Rights Reserved.

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