Fabrication and characterization of VO2 metasurfaces (IMAGE)

Ulsan National Institute of Science and Technology(UNIST)

Fabrication and characterization of VO2 metasurfaces

Caption

Figure 1. Schematics of fabrication steps: A vanadium slit array is patterned on a c-plane sapphire substrate by photolithography. After that, the vanadium slit array is annealed under optimized oxygen pressure and temperature. After the annealing process, the thickness of the film doubled.

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UNIST

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