Template preparation. (IMAGE)

Light Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS

Template preparation.

Caption

(a) Schematic diagram of the heteroepitaxial laser integration on Si platform. (b) Schematic diagram of the pattern formation process before III-V deposition. (c) As-patterned 300 mm Si wafer.

Credit

by Chen Shang, Kaiyin Feng, Eamonn T. Hughes, Andrew Clark, Mukul Debnath, Rosalyn Koscica, Gerald Leak, Joshua Herman, David Harame, Peter Ludewig, Yating Wan, and John E. Bowers

Usage Restrictions

Credit must be given to the creator.

License

CC BY

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