Real-Time Etching Topography (IMAGE)
Caption
This is a three-dimensional image of the University of Illinois logo etched into a gallium-arsenide semiconductor, taken during etching with a new microscopy technique that monitors the etching process on the nanometer scale. The height difference between the orange and purple regions is approximately 250 nanometers.
Credit
Chris Edwards, Amir Arbabi, Gabriel Popescu, and Lynford Goddard
Usage Restrictions
None
License
Licensed content