Simulated Relationship (IMAGE) Japan Science and Technology Agency Caption Simulated relationship between resistance ratio at on-state and off-state, required ferroelecric-HfO2 thickness, and memory cell diameter for targeting (left) 10nA read current and (right) 100nA read current, respectively. For such read current target, FTJ memory cell can be scaled down to 2nm diameter as long as ferroelectricity is maintained at 1~1.5nm film thickness. Credit Masaharu Kobayashi Usage Restrictions None License Licensed content Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.