Plasma atomic layer deposition (IMAGE)

Ruhr-University Bochum

Plasma atomic layer deposition

Caption

A plasma atomic layer deposition reactor is used to coat the substrate with the two-dimensional silicon dioxide material.

Credit

RUB, Kramer

Usage Restrictions

The image may only be used for reporting about Ruhr-Universität Bochum in the context of the press release "A sieve for molecules", published in March 2022.

License

Original content

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