AIT vs. SHARP (IMAGE) DOE/Lawrence Berkeley National Laboratory Caption At top left are programmed pattern defects, including the large protrusion in the center, developed by a team at IBM to evaluate printing sensitivity. The current AIT microscope's image of the defects is center left. The final stage of the AIT's beam path is shown bottom left: the synchrotron's EUV beam enters from the top, reflects from the mask, is focused by an array of zone plates, and then reflects from a turning mirror to an EUV-sensitive camera, not shown, to the left. The more efficient SHARP beam path at right removes the turning mirror and a window from the array of zone plates to increase brightness. SHARP incorporates other refinements such as a new high-efficiency illuminator, a tunable monochromator that controls the coherence of the light, and a choice of zone plate lenses for different magnifications as the microscope navigates around the mask. Credit Lawrence Berkeley National Laboratory Usage Restrictions None License Licensed content Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.