The metallization process based on modified tannic acid photoresist pattern (IMAGE)

Industrial Chemistry & Materials

The metallization process based on modified tannic acid photoresist pattern

Caption

A new process of in situ Ag fine pattern formation by direct pattern transfer of a modified tannic acid photoresist and in situ electroless plating in an Ag ion solution was reported.

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Wenbing Kang, Shandong University, China

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