Wet-Like Plasma Etching (IMAGE) Nagoya University Caption Research developed a new method called “wet-like plasma etching” that combines the key features of two existing techniques: wet etching and dry etching. Credit Nagoya University Usage Restrictions Credit must be given License Original content Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.