The parallel peripheral-photoinhibition lithography system comprises eight modules that are arranged to allow the individual control of the split excitation and inhibition beams, thereby allowing the high-resolution, high-efficiency fabrication of nanostructures. (IMAGE)

SPIE--International Society for Optics and Photonics

The parallel peripheral-photoinhibition lithography system comprises eight modules that are arranged to allow the individual control of the split excitation and inhibition beams, thereby allowing the high-resolution, high-efficiency fabrication of nanostructures.

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The parallel peripheral-photoinhibition lithography system comprises eight modules that are arranged to allow the individual control of the split excitation and inhibition beams, thereby allowing the high-resolution, high-efficiency fabrication of nanostructures.

Credit

Zhu et al., doi 10.1117/1.AP.4.6.066002.

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