Block Copolymer Art (IMAGE) DOE/Argonne National Laboratory Caption This is a cross-section scanning electron microscopy image after hydrogen silsesquioxane patterning, sequential infiltration synthesis and removal of initiated chemical vapor deposition topcoat and organic components. Credit Hyo Seon Suh / University of Chicago Usage Restrictions None License Licensed content Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.