Nanolaser (IMAGE)
Caption
This is an illustration of the nanoscale semiconductor structure used for demonstrating the ultra-low-threshold nanolaser. A single nanorod is placed on a thin silver film (28 nm thick). The resonant electromagnetic field is concentrated at the 5-nm-thick silicon dioxide gap layer sandwiched by the semiconductor nanorod and the atomically smooth silver film.
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copyright <i>Science</i>
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