Nanotower (IMAGE) Toyohashi University of Technology (TUT) Caption 細胞膜を突き破る高さ100 µm以上の‘ナノタワー’電極。シリコン結晶成長技術と三次元的なマイクロ/ナノプロセス技術により、非常にアスペクト比の高い細胞内電極を実現した。 Credit COPYRIGHT (C) TOYOHASHI UNIVERSITY OF TECHNOLOGY. ALL RIGHTS RESERVED. Usage Restrictions None License Licensed content Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.