Lithography and Molecular Self-assembly (IMAGE)
Caption
A new technique of chemical patterning developed at Penn State combines conventional lithography with molecular self-assembly for the creation of multifunctional surfaces. In this technique, a robust lithographic resist is patterned to protect chemical functionality in selected areas. In unprotected areas, the chemical functionality is selectively removed so that other chemical functionality can be placed in these regions. The process can be repeated to create multifunctional surfaces. A schematic of the photolithography-assisted chemical patterning technique, using organic-acid molecules (COOH, red) as the first component of the self-assembled monolayer (SAM) and methyl-group-terminated molecules (CH3, blue) as the second component. After the first SAM is placed, a robust lithographic resist is patterned on top of it. A section of the first component of the SAM is then removed only in the unprotected regions, and the second component of the SAM is deposited in the resulting open areas of the surface. The lithographic resist prevents movement of molecules between the SAM components.
Credit
Paul Weiss lab, Penn State
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