finFET (IMAGE) Purdue University Caption Researchers are making progress in developing new types of transistors, called finFETs, which use a finlike structure instead of the conventional flat design, possibly enabling engineers to create faster and more compact circuits and computer chips. The fins are made not of silicon, but from a material called indium-gallium-arsenide, as shown in this illustration. Credit Birck Nanotechnology Center, Purdue University Usage Restrictions None License Licensed content Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.