Flat fixtures for EUV exposure (IMAGE) Fraunhofer-Gesellschaft Caption The EUV mask chuck will support the manufacture of silicon chips in the future: It holds the bent exposure mask in place overhead and almost perfectly levels it. Credit Fraunhofer IOF Usage Restrictions The picture may be used for editorial purposes only. It is protected by copyright. The use is free of charge if the reference is mentioned. License Licensed content Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.