The calculated temperature rise distribution of the metasurface (IMAGE)

Advanced Devices & Instrumentation

The calculated temperature rise distribution of the metasurface

Caption

(A) polysilicon and (B) amorphous silicon (D = 400 nm) cylinder when the laser power density is 1.00×105 W/cm2. Maximum temperature rises of the (C) polysilicon and (D) amorphous silicon metasurface for different values of diameter and power density.

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Advanced Devices & Instrumentation

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