Nanolattice Structure Fabricated Using Two-Photon Laser Direct Writing Lithography (IMAGE)

Cactus Communications

Nanolattice Structure Fabricated Using Two-Photon Laser Direct Writing Lithography

Caption

Researchers have created a new type of epoxy photoresist that greatly improves the speed and detail of two-photon laser writing. This new material can write at a speed of 100 mm/s and can create tiny features as small as 170 nanometers, paving the way for faster production of micro-devices.

Credit

Cuifang Kuang from Zhejiang Lab, Hangzhou, China

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