Chemically Tailored Block Copolymers for Generating Highly Reliable Nanometer-Scale Patterns (IMAGE) Tokyo Institute of Technology Caption These BCPs could pave the way to revolutionary breakthroughts in manufacturing improved semiconductors. Credit Tokyo Institute of Technology Usage Restrictions None License Original content Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.